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Atomic-scale characteristics of surfaces dictate the principles governingnumerous scientific phenomena ranging from catalysis to friction. Despite thisfact, our ability to visualize and alter surfaces on the atomic scale isseverely hampered by the strict conditions under which the related methods areoperated to achieve high spatial resolution. In particular, the two prominentmethods utilized to achieve atomic-resolution imaging - scanning tunnelingmicroscopy (STM) and noncontact atomic force microscopy (NC-AFM) - aretypically performed under ultrahigh vacuum (UHV) and often at low temperatures.Perhaps more importantly, results obtained under such well-controlled, pristineconditions bear little relevance for the great majority of processes andapplications that often occur under ambient conditions. As such, a method thatcan robustly image surfaces on the atomic scale under ambient conditions haslong been thought of as a "holy grail" of surface science. Here, by way of aproof-of-principle measurement on molybdenum disulfide (MoS2), we report thatthe method of conductive atomic force microscopy (C-AFM) can be utilized toachieve true atomic-resolution imaging under ambient conditions as proven bythe imaging of a single atomic vacancy, without any control over theoperational environment or elaborate sample preparation. While the physicalmechanisms behind this remarkable observation are not elucidated yet, ourapproach overcomes many of the classical limitations associated with STM andNC-AFM, and the findings herald the potential emergence of C-AFM as a powerfultool for atomic-resolution imaging under ambient conditions.

True Atomic-Resolution Imaging under Ambient Conditions via Conductive Atomic Force Microscopy