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This paper presents the development of scientific instrumentation for thefabrication of ferromagnetic thin films, by sputtering technique, for the useof 2-inch-diameter targets. Thin films were deposited using Permalloy alloy(Ni80Fe20) as ferromagnetic material at room temperature on Si (001)substrates. The film thicknesses were measured with profilometry and adeposition rate for this alloy of 16.2 nm/min was calculated. Scanning electronmicroscopy showed a continuous film formation and a chemical compositionsimilar to the target

Fabricacion de un magnetron sputtering para deposito de peliculas nanometricas magneticas