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Nb3Sn films were fabricated by multilayer sequential sputtering on Nb atsubstrate temperatures ranging from room temperature to 250 {\deg}C. Themultilayers were then annealed inside a separate vacuum furnace at 950 {\deg}Cfor 3h. The films material properties were characterized by X-ray diffraction,scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomicforce microscopy, and transmission electron microscopy. The filmssuperconducting properties were studied by four-point probe resistivitymeasurements from room temperature to below the superconducting criticaltemperature Tc. The highest film Tc was 17.76 K, obtained when the multilayerswere deposited at room temperature. A superconducting Nb3Sn thin film with asmoother surface morphology but a lower Tc of 17.58 K was obtained on the filmdeposited at a substrate temperature of 250 {\deg}C.

Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering