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The sub-bandgap absorption and ultrafast relaxation in a GaAs/ErAs/GaAsheterostructure are reported. The infrared absorption and 1550 nm-excitedultrafast photo-response are studied by Fourier transform infrared (FTIR)spectrometry and time-domain pump-probe technique. The two absorption peakslocated at 2.0 um (0.62 eV) and 2.7 um (0.45 eV) are originated from theErAs/GaAs interfacial Schottky states and sub-bandgap transition within GaAs,respectively. The photo-induced carrier lifetime, excited using 1550 nm light,is measured to be as low as 190 fs for the GaAs/ErAs/GaAs heterostructure,making it a promising material for 1550-nm-technology-compatible, highcritical-breakdown-field THz devices. The relaxation mechanism is proposed andthe functionality of ErAs is revealed.

1550 nm compatible ultrafast photoconductive material based on a GaAs/ErAs/GaAs heterostructure