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The annealing treatment in the advanced manufacturing process, e.g.,laser-assisted manufacturing, determines the final state of glasses which iscritical to its thermal, electrical and mechanical properties. Energy barriersanalysis based on the potential energy surface offers an effective way to studythe microscopic evolution of the inherent structures during the annealingprocess in a broadening timescale range, i.e., from atomistic timescale ( ~ ps)to experimental timescale (~ s). Here, we find the distribution activationenergy barriers in the potential energy surface can be divided into threeregimes 1, the distribution mainly follows the Rayleigh distribution when theannealing rate Rdot < 1e15 K/s; 2, two different modes, i.e., an exponentiallydecaying mode and a Rayleigh distribution mode, are found in the spectra whenthe annealing rate 1e15 K/s < Rdot < instant; 3, the spectra is almostfollowing the exponentially decaying mode when the system is under the instantannealing process. However, the spectra of relaxation energy barriers only showan exponentially decaying mode with a decreasing decay parameter. A multitimescale model for any specific annealing rate, which is beyond the limit ofthe conventional atomistic simulations, i.e., molecular dynamics simulations,is then proposed based on the distribution of the energy barriers. Such a modelenables quantitative explanations and predictions of the heat release duringthe annealing process of the nanocalorimetry measurements or laser-assistedmanufacturing.

How Thermal Annealing Process Determines the Inherent Structure  Evolution in Amorphous Silicon: An Investigation from Atomistic Time Scales  to Experimental Time Scales