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Large imaging arrays of detectors at millimeter and submillimeter wavelengthshave applications that include measurements of the faint polarization signal inthe Cosmic Microwave Background (CMB), and submillimeter astrophysics. We aredeveloping planar lenslet arrays for millimeter-wavelength imaging usingmetamaterials microlithically fabricated using silicon wafers. Thismetamaterial technology has many potential advantages compared to conventionalhemispherical lenslet arrays, including high precision and homogeneity, planarintegrated anti-reflection layers, and a coefficient of thermal expansionmatched to the silicon detector wafer. Here we describe the design process fora gradient-index (GRIN) metamaterial lenslet using metal-mesh patterned onsilicon and a combination of metal-mesh and etched-hole metamaterialanti-reflection layers. We optimize the design using a bulk-material model torapidly simulate and iterate on the lenslet design. We fabricated prototypeGRIN metamaterial lenslet array and mounted it on a Polarbear/Simons Array90/150~GHz band transition edge sensor (TES) bolometer detector array withsinuous planar antennas. Beam measurements of a prototype lenslet array agreereasonably well with the model simulations. We plan to further optimize thedesign and combine it with a broadband anti-reflection coating to achieveoperation over 70--350~GHz bandwidth.

Planar Silicon Metamaterial Lenslet Arrays for Millimeter-wavelength Imaging