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We report the existence of an enhanced operating regime for a high-frequency,low-pressure capacitively coupled plasma (CCP) discharge in the presence of aweak magnetic field applied parallel to the electrodes. Our PIC-MCC simulationsshow that the plasma density and ion flux values exhibit a sharp peak when theelectron cyclotron frequency equals half of the applied RF frequency. Thephysical mechanism responsible for this behaviour is traced to asynchronization between the oscillatory motion of the electrode sheath edge andthe motion of a set of electrons reflected by this sheath. These electrons gaina substantial amount of energy that causes a concomitant higher ionisationleading to a peak in the ion flux. Our theoretical findings should be easy toverify experimentally in present day CCP devices and could provide usefulguidelines for enhancing the operational performance of CCP devices inindustrial applications.

An enhanced operating regime for high frequency capacitive discharges