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The interlayer bonding in two dimensional materials is particularly importantbecause it is not only related to their physical and chemical stability butalso affects their mechanical, thermal, electronic, optical, and otherproperties. To address this issue, we report the direct characterization of theinterlayer bonding in 2D SnSe using contact-resonance atomic force microscopyin this study. Site specific CR spectroscopy and CR force spectroscopymeasurements are performed on both SnSe and its supporting SiO2 substratecomparatively. Based on the cantilever and contact mechanic models, the contactstiffness and vertical Young's modulus are evaluated in comparison with SiO2 asa reference material. The interlayer bonding of SnSe is further analyzed incombination with the semi-analytical model and density functional theorycalculations. The direct characterization of interlayer interactions using thisnondestructive methodology of CR AFM would facilitate a better understanding ofthe physical and chemical properties of 2D layered materials, specifically forinterlayer intercalation and vertical heterostructures.

Local probe of the interlayer coupling strength of few-layers SnSe by contact-resonance atomic force microscopy