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This document is a joint response by scientists from the Princeton PlasmaPhysics Laboratory, IBM T. J. Watson Research Center and Applied Materials,Inc. to the DOE Office of Science (DOE-SC) Request for Information: BasicResearch Initiative for Microelectronics(https://www.federalregister.gov/documents/2019/07/12/2019-14869/request-for-information-basic-research-initiative-for-microelectronics).Specifically, we propose DOE-SC to include the following topics in theirconsideration for future solicitations on Microelectronics: 1) The developmentof a real-time monitoring and in-situ diagnostic techniques that can provideinformation on plasma, substrate surface, and interaction between both duringatomic precision processing of complex materials for the most advancedmicroelectronic devices with applications to high performance computing andartificial intelligence, and 2) The development of experimentally validatedmodeling tools to predict processing dynamics including plasma, chemical andmaterial processes involved.

Atomic Precision Processing of New Materials for Frontier Microelectronic Applications in High Performance Computing and Artificial Intelligence