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We demonstrate the extensive study on how film density and crystallinity ofmolybdenum carbide ($MoC_{x}$) can be tailored during plasma-enhanced ALD(PEALD) by controlling either the plasma exposure time or the ion energy. Weinvestigated $MoC_{x}$ films grown using $Mo(^tBuN)_2(NMe_2)_2$ as theprecursor and $H_2/Ar$ plasma as the co-reactant at temperatures between150{\deg}C and 300{\deg}C. We discover a threshold for graphitic layerformation at high mean ion energies during the PEALD cycle. The supplied highenergy dose allows for hybridised $sp^{2}$ carbon bonds formation, similar tohigh temperature annealing. The graphitisation of the $MoC_{x}$ surface takesplace at temperature of 300$^{\circ}C$. The graphitic film show a (101) planediffraction peak with dominant intensity in XRD, and a typical $sp^{2}$ C1speak along with carbidic metal in XPS measurements. Surface roughness of thefilm lowers significantly at the graphitisation regime of deposition. This lowtemperature graphitisation by high energy plasma ions during PEALD shows agreat promise to advancing graphene and graphite composites at low temperatureby PEALD for future applications.

Tailored Molybdenum Carbide Properties and Graphitic Nano Layer Formation by Plasma and Ion Energy Control during Plasma Enhanced ALD