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Single-walled carbon nanotube (SWCNT) films are promising materials fortransparent conductive films (TCFs) with potential applications in flexibledisplays, touch screens, solar cells and solid-state lighting1,2. However,further reductions in resistivity and in cost of SWCNT films are necessary forhigh quality TCF products3. Here, we report an improved floating catalystchemical vapor deposition method to directly and continuously produce ultrathinand freestanding SWCNT films at the hundred meter-scale. Both carbon conversionefficiency and SWCNT TCF yield are increased by three orders of magnituderelative to the conventional floating catalyst chemical vapor deposition. Afterdoping, the film manifests a sheet resistance of 40 ohm/sq. at 90%transmittance, representing record performance for large-scale SWCNT films. Ourwork provides a new avenue to accelerate the industrialization of SWCNT filmsas TCFs.

High Throughput Production of Transparent Conductive Single-Walled Carbon Nanotube Films via Advanced Floating Catalyst Chemical Vapor Deposition