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We study the formation of nanometer thick oxide layers around nanoparticles(plateaus) in a wet nitrogen environment over 32 days. We determine both theplateau height and the lateral force needed to remove the particles with anatomic force microscope (AFM). The height is well described by the Deal-Grovemodel for a thermally activated diffusion limited oxidation process.Furthermore, we observe that height and force appear to be correlatedsuggesting that the rise in adhesion forces is mainly governed by an oxidationprocess. Since the plateaus are the result of a change in the chemicalstructure, the surface remains permanently altered even after the removal ofthe nanoparticles. This observation is of great importance for manyapplications requiring smooth silicon surfaces, such as photolithography, wheresmall contamination can cause the observed oxidation process and significantlyincrease the surface roughness.

Deal-Grove Oxidation and Nanoparticle Adhesion - an AFM Study