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In this paper, we present a new 9T SRAM cell that has good write-ability andimproves read stability at the same time. Simulation results show that theproposed design increases Read SNM (RSNM) and Ion/Ioff of read path by 219% and113%, respectively at supply voltage of 300mV over conventional 6T SRAM cell ina 90nm CMOS technology. Proposed design lets us to reduce minimum operatingvoltage of SRAM (VDDmin) to 350mV, whereas conventional 6T SRAM cannot operatesuccessfully with acceptable failure rate at supply voltages bellow 725mV. Wealso compared our design with three other SRAM cells from recent literature. Toverify the proposed design, a 256kb SRAM is designed using new 9T andconventional 6T SRAM cells. Operating at their minimum possible VDDs, theproposed design decreases write and read power per operation by 92%, and 93%,respectively over the conventional rival. Area of proposed SRAM cell isincreased by 83% over conventional 6T one. However, due to large Ion/Ioff ofread path for 9T cell, we are able to put 1k cells in each column of 256kb SRAMblock, resulting in the possibility for sharing write and read circuitries ofeach column between more cells compared to conventional 6T. Thus, area overheadof 256kb SRAM based on new 9T cell is reduced to 37% compared to 6T SRAM.

A 256kb 9T Near-Threshold SRAM With 1k Cells per Bit-Line and Enhanced Write and Read Operations