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By combining analytical and numerical approaches, we theoreticallyinvestigate the effect of fabrication imperfections, e.g. roughness at metalinterfaces, on nanometer metal-insulator-metal waveguides supporting slowgap-plasmon modes. Realistic devices with vapor deposition- andchemically-grown metal films are considered. We obtain quantitative predictionsfor the attenuations induced by absorption and by backscattering, andanalytically derive how both attenuations scale with respect to the groupvelocity. Depending on the material parameters and fabrication quality,roughness-induced backscattering is find to be a significant additional sourceof attenuation for small group velocities, which is often neglected in theliterature.

Attenuation of slow Metal-Insulator-Metal plasmonic waveguides, from Joule absorption to roughness-induced backscattering