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Vertical stacking of monolayers via van der Waals assembly is an emergingfield that opens promising routes toward engineering physical properties oftwo-dimensional (2D) materials. Industrial exploitation of these engineeringheterostructures as robust functional materials still requires bounding theirmeasured properties so to enhance theoretical tractability and assist inexperimental designs. Specifically, the short-range attractive van der Waalsforces are responsible for the adhesion of chemically inert components and arerecognized to play a dominant role in the functionality of these structures.Here we reliably quantify the the strength of van der Waals forces in terms ofan effective Hamaker parameter for CVD-grown graphene and show how it scales bya factor of two or three from single to multiple layers on standard supportingsurfaces such as copper or silicon oxide. Furthermore, direct measurements onfreestanding graphene provide the means to discern the interplay between thevan der Waals potential of graphene and its supporting substrate. Our resultsdemonstrated that the underlying substrates could enhance or reduce the van derWaals force of graphene surfaces, and its consequences are explained in termsof a Lifshitz theory-based analytical model.

Direct Measurement of the Magnitude of van der Waals interaction of Single and Multilayer Graphene