English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

The choice of a reflective optical coating or filter material has to beadapted to the intended field of application. This is mainly determined by therequired photon energy range or by the required reflection angle. Among variousmaterials, nickel and rhodium are standard materials used as reflectivecoatings for synchrotron mirrors. Conversely, Aluminum is one of the mostcommonly used materials for extreme ultraviolet (EUV) and soft X-ray filters.However, both of these types of optics are subject to carbon contamination,being increasingly problematic for the operation of the high-performance freeelectron laser (FEL) and synchrotron beamlines. For this reason, an inductivelycoupled plasma (ICP) source has been used in conjunction with N2/O2/H2 andN2/H2 feedstock gas plasmas. Results from the chemical surface analysis of theabove materials before and after plasma treatment using X-ray photoelectronspectroscopy (XPS) are reported. We conclude that a favorable combination of anN2/H2 plasma feedstock gas mixture leads to the best chemical surfacepreservation of Ni, Rh, and Al while removing the carbon contaminations.However, this feedstock gas mixture does not remove C contaminations as rapidlyas, e.g., a N2/O2/H2 plasma which induces the surface formation of NiO andNiOOH in Ni and RhOOH in Rh foils. As an applied case, we demonstrate thesuccessful carbon removal from ultrathin Al filters previously used at theFERMI FEL1 using a N2/H2 plasma.

Towards chemically neutral carbon cleaning processes: Plasma cleaning of  Ni, Rh, and Al reflective optical coatings and thin Al filters for Free  Electron Lasers and synchrotron beamline applications