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The chemical mixing at the Fe-on-Ti and Ti-on-Fe, i.e. the bottom and topinterfaces of Fe in atomically deposited layers, were studied experimentallyand by molecular dynamics simulations of the layer growth. The basic structureand chemical composition of the layers were explored in cross-sections usingtransmission electron microscopy. The calculations show a concentrationdistribution along the layer growth direction which is atomically sharp at theTi-on-Fe interface for the (001) and (110) crystallographic orientations of theFe layer, while it varies over a few atomic layers for Fe(111) substrate and atthe Fe-on-Ti interface for all studied substrate orientations. Conversionelectron M\"ossbauer spectroscopy and X-ray reflectometry measurements indicatean even larger asymmetry of the bottom and top Fe interface in Ti/Fe/Titrilayers grown over Si(111) substrate by vacuum evaporation.

Alloy formation at the bottom and top Fe interfaces of Ti/Fe/Ti trilayers