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Materials such as W, TiN, and SrRuO3 (SRO) have been suggested as promisingalternatives to Au and Ag in plasmonic applications owing to their refractoryproperties. However, investigation of the reproducibility of the opticalproperties after thermal cycling at high operational temperatures is so farlacking. Here, thin films of W, Mo, Ti, TiN, TiON, Ag, Au, and SrRuO3 areinvestigated to assess their viability for robust refractory plasmonicapplications. Films ranging in thickness from 50 - 180 nm are deposited on MgOand Si substrates by RF magnetron sputtering and, in the case of SrRuO3, pulsedlaser deposition, prior to characterisation by means of AFM, XRD, spectroscopicellipsometry, and DC resistivity. Measurements are conducted before and afterannealing in air at temperatures ranging from 300 - 1000{\deg} C for one hour,to establish the maximum cycling temperature and potential longevity attemperature for each material. It is found that SrRuO3 retains metallicbehaviour after annealing at 800{\deg} C, however, importantly, the opticalproperties of TiN and TiON are degraded as a result of oxidation. Nevertheless,both TiN and TiON may be better suited than Au or SRO for high temperatureapplications operating under vacuum conditions.

Stability of Thin Film Refractory Plasmonic Materials Taken to High Temperatures in Air