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Here we propose a linear microbolometric array based on VOx thin films. Thelinear microbolometric array is fabricated by using micromachining technology,and its thermo-sensitive VOx thin film has excellent infrared response spectrumand TCR characteristics. Nano-scale VOx thin films deposited on SiO2/Sisubstrates were obtained by e-beam vapor deposition. The VOx films were thenannealed at temperatures between 300 to 500 C with various deposition durationtime. The crystal structures and microstructures were examined by XRD, SEM andESCA. These films showed a predominant phase of rhombohedral VO2 and thecrystallinity of the VO2 increased as the annealing temperature increased.Integrated with CMOS circuit, an experimentally prototypical monolithic linearmicrobolometric array is designed and fabricated. The testing results of theexperimental linear array show that the responsivity of linear array canapproach 18KV/W and is potential for infrared image systems.

Bolometric arrays and infrared sensitivity of VO2 films with varying stoichiometry