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By patterning a freestanding dielectric membrane into a photonic crystalreflector (PCR), it is possible to resonantly enhance its normal-incidencereflectivity, thereby realizing a thin, single-material mirror. In many PCRapplications, the operating wavelength (e.g. that of a low-noise laser oremitter) is not tunable, imposing tolerances on crystal geometry that are notreliably achieved with standard nanolithography. Here we present a gentletechnique to finely tune the resonant wavelength of a SiN PCR using iterativehydrofluoric acid etches. With little optimization, we achieve a 57-nm-thinphotonic crystal having an operating wavelength within 0.15 nm (0.04 resonancelinewidths) of our target (1550 nm). Our thin structure exhibits a broader andless pronounced transmission dip than is predicted by plane wave simulations,and we identify two effects leading to these discrepancies, both related to thedivergence angle of a collimated laser beam. To overcome this limitation infuture devices, we distill a series of simulations into a set of general designconsiderations for realizing robust, high-reflectivity resonances.

Etch-Tuning and Design of Silicon Nitride Photonic Crystal Reflectors