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In this work, the single-component Cu metallic glass was fabricated by thephysical vapor deposition on the Zr (0001) crystal substrate at 100 K using theclassical molecular dynamic simulation. The same deposition process wasperformed on the Cu (1 0 0) and Ni (1 0 0) crystal substrate for comparison,only the Cu crystal deposited layer with the fcc structure can be obtained.When depositing the Cu atoms on the Zr substrate at 300 K, the crystalstructure was formed, which indicates that except the suitable substrate, lowtemperature is also a key factor for the amorphous structure formation. The Culiquid quenching from 2000 K to 100 K were also simulated with the cooling rate1012 K/s to form the Cu glass film in this work. The Cu metallic glass from thetwo different processes (physical vapor deposition and rapid thermal quenchingfrom liquid) revealed the same radial distribution function and X-raydiffraction pattern, but the different microstructure from the coordinationnumber and Voronoi tessellation analysis.

Molecular dynamics simulation of fabrication of Cu mono-component metallic glass by physical vapor deposition on Zr substrate