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Graphene plasmons are of remarkable features that make graphene plasmonelements promising for applications to integrated photonic devices. Thefabrication of graphene plasmon components and control over plasmon propagatingare of fundamental important. Through near-field plasmon imaging, wedemonstrate controllable modifying of the reflection of graphene plasmon atboundaries etched by ion beams. Moreover, by varying ion dose at a propervalue, nature like reflection boundary can be obtained. We also investigate theinfluence of ion beam incident angle on plasmon reflection. To illustrate theapplication of ion beam etching, a simple graphene wedge-shape plasmonstructure is fabricated and performs excellently, proving this technology as asimple and efficient tool for controlling graphene plasmons.

Tailoring reflection of graphene plasmons by focused ion beams