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We present the results of multi-objective genetic algorithm optimizations ofa potential single shot ultra fast electron diffraction beamline utilizing a100 MV/m 1.6 cell normal conducting rf (NCRF) gun, as well as a 9 cell 2pi/3bunching cavity placed between two solenoids. Optimizations of the transverseprojected emittance as a function of bunch charge are presented and discussedin terms of the scaling laws derived in the charge saturation limit.Additionally, optimization of the transverse coherence length as a function offinal rms bunch length at the sample location have been performed for a chargeof 1e6 electrons. Analysis of the solutions is discussed, as are the effects ofdisorder induced heating. In particular, for a charge of $10^6$ electrons andfinal beam size greater than or equal to 25 microns, we found a relativecoherence length of 0.07, 0.1, and 0.2 nm/micron for a final bunch length ofapproximately 5, 30, and 100 fs, respectively. These results demonstrate theviability of using genetic algorithms in the design and operation of ultrafastelectron diffraction beamlines.

Multi-objective Optimizations of a Normal Conducting RF Gun Based Ultra Fast Electron Diffraction Beamline