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The region of permanent densification beneath a Berkovich indentation imprintin silica glass is investigated using a novel chemical dissolution technique.The use of the similitude regime in sharp indentation testing allows one torecord reliable data with a good spatial resolution that makes it possible todeal with low loads (typically below 10 mN) and crack-free imprints. Thedensified zone dissolves much quicker than the non densified regions. Theanalysis of the results, along the vertical axis, indicates that thedensification zone is rather homogeneous with a steep transition to the nondensified zone. The size of the densification zone, with respect to the initialfree surface, is estimated to be around 1.9 the maximum penetration depth ofthe instrumented indentation test. These findings are compared with formerexperimental data and critically compared with the results of numericalsimulations from selected constitutive equations and other numerical techniquesfrom the literature. These comparisons highlight some advantages anddisadvantages of existing modelings and thus call for further advanced progresson that matter. They nevertheless favor mostly the contribution of thedensification process with respect to the plastic flow (volume conservativeprocess) in creating a permanent imprint.

A chemical dissolution technique for challenging existing constitutive  models of the densification process beneath an indentation imprint in  amorphous silica