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Degradation of co-evaporated CH3NH3PbI3 thin films was investigated withx-ray photoelectron spectroscopy (XPS) and x-ray diffraction (XRD) as the filmswere subjected to exposure of oxygen, dry air, ambient, or H2O. Theco-evaporated thin films have consistent stoichiometry and crystallinitysuitable for detailed surface analysis. The results indicate that CH3NH3PbI3 isnot sensitive to oxygen. Even after 10^13 Langmuire (L, one L equals 10^-6 torrsec) oxygen exposure, no O atoms could be found on the surface. The film is notsensitive to dry air as well. A reaction threshold of about 2*10^10 L is foundfor H2O exposure, below which no CH3NH3PbI3 degradation takes place and the H2Oacts as an n-dopant. Above the threshold, the film begins to decompose, and theamount of N and I decrease quickly, leaving the surface with PbI2, amorphous Cand O contamination.

Degradation by Exposure of Co-Evaporated CH3NH3PbI3 Thin Films