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The energy flux patterns of inverse Goos-Hanchen (GH) shift around theinterface between air and negatively refractive photonic crystal (NRPhC) withdifferent surface terminations is investigated. Results show that NRPhCexhibits inverse GH shift in TM and TE polarization, and the localization andpattern of energy flux differ in TM and TE polarizations and are stronglyaffected by surface termination. This is different to the condition of negativepermittivity materials (i.e., metal), which only presents inverse GH shift inTM polarization. In the case of TE polarization, the energy flux patternexhibits the flux of backward wave whose localization changes from the surfaceto inside of NRPhC with the variation of surface termination. In the case of TMpolarization, the energy flux pattern is always confined within the surface ofNRPhC, whereas its pattern changes from the flux of backward wave to vorticesat the surface of NRPhC, which is different to the energy flux of TMpolarization of metal. By properly truncating the surface of NRPhC we cancontrol the magnitude of inverse GH shift for TM and TE polarized light.

Energy flux pattern of inverse Goos-Hanchen shift in photonic crystals with negative index of refraction