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In this work, we studied phase formation, structural and magnetic propertiesof iron-nitride (Fe-N) thin films deposited using high power impulse magnetronsputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). Thenitrogen partial pressure during deposition was systematically varied both inHiPIMS and dc-MS. Resulting Fe-N films were characterized for theirmicrostructure, magnetic properties and nitrogen concentration. We found thatHiPIMS deposited Fe-N films show a globular nanocrystalline microstructure andimproved soft magnetic properties. In addition, it was found that the nitrogenreactivity impedes in HiPIMS as compared to dc-MS. Obtained results can beunderstood in terms of distinct plasma properties of HiPIMS.

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering