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Atomic Force Microscopy (AFM) and Grazing Incidence X-Ray Diffraction(GI-XRD) are used to characterize the nanomorphology of spin-coated low (LMW,Mn = 12 kg/mol, regioregularity RR = 84%) and high (HMW, Mn = 39 kg/mol, RR =98%) molecular weight poly(3-hexylselenophene) (P3HS) films and blend films ofP3HS with [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), before and afterthermal annealing at 250 {\deg}C.

Nanomorphology of Annealed P3HS and P3HS:PCBM Films for OPV Applications