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To explore possibilities for X-ray flux monitoring on optical elementselectrical responses of silicon and diamond single crystals and that of anX-ray mirror were studied under exposure to hard X-rays in a single electrodeconfiguration in ambient air. To introduce flux monitoring as a non-invasivecapability a platinum electrode was deposited on a small unexposed portion ofthe entrance surface of the crystals while for the X-ray mirror the entiremirror surface served as an electrode. It was found that the electricalresponses are affected by photoemission and photoionization of the surroundingair. The influence of these factors was quantified using estimations of totalelectron yield and the ionization current. It is shown that both phenomena canbe used for the non-invasive monitoring of hard X-ray flux on the opticalelements. Relevant limits of applicability such as detection sensitivity andcharge collection efficiency are identified and discussed.

Flux monitoring hard X-ray optics in a single electrode configuration