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Numerical simulation of pattern formation on plane target surfaces undergoingion-beam sputtering is carried out. Base of the mathematical model of targetion-sputtering is nonlinear evolutionary equation in which the erosion velocitydependence on ion flux is evaluated by means of a Monte Carlo method. Thisapproach needs much computational resources, but allows to investigate theinfluence of ion flux parameters on surface topography. Deviation of thefindings from the pattern formation predicted by the continuum model isdiscussed.

Statistical simulation of pattern formation on plane target surfaces by ion beam sputtering