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We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractiveimaging in the most general reflection geometry by combining ptychography withtilted plane correction. This method makes it possible to image extendedsurfaces at any angle of incidence. Refocused light from a tabletop coherenthigh harmonic light source at 29 nm illuminates a nanopatterned surface at 45degree angle of incidence. The reconstructed image contains quantitativeamplitude and phase (in this case pattern height) information, comparingfavorably with both scanning electron microscope and atomic force microscopyimages. In the future, this approach will enable imaging of complex surfacesand nanostructures with sub-10 nm-spatial resolution and fs-temporalresolution, which will impact a broad range of nanoscience and nanotechnologyincluding for direct application in actinic inspection in support of EUVlithography.

Tabletop Nanometer Extreme Ultraviolet Imaging in an Extended Reflection Mode using Coherent Fresnel Ptychography