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We have introduced here a simple, single step and cost effective broad ionbeam technique for preparation of nanoscale electronic, magnetic, optical andmechanical devices without the need of resist, mask, or focused electron andion beams. In this approach, broad beam ion implantation of desired atom on aprefabricated ion beam patterned surface promotes site selective deposition byadjusting the local angle of ion implantation. We show that implantation of Feions on an O+ induced pre fabricated triangular shaped patterned Si surfaceresults in a self-organized periodic array of striped magnetic nanostructureshaving several micron length and about 50 nm width arranged with a lateralseparation of ~ 200 nm. The morphology, composition, crystalline structure andmagnetic property of these nanopatterns have been analyzed and the crucialfeature of such nanopattern formation by broad beam ion implantation isexplained.

Large area buried nanopatterning by broad ion implantation without any mask or direct writing