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Laser Interference Lithography (LIL) is a versatile fabrication method forpatterning sub-micron structures in arrays covering large areas. It is a facileand fast mask-less lithography process to produce large area periodic patterns.The objective in this study is to simulate and design periodic andquasi-periodic 1D, 2D and 3D nanostructures using two-beam interferencetechnique. We designed and simulated periodic and quasi-periodic structures bytwo-beam interference patterning using a MATLAB program by varying angle ofincidence, wavelength and geometry. The generated patterns/features depend onthe interference intensity, wavelength, slit separation and angle of incidence.Using this technique, we can achieve potentially high-volume of uniformity,throughput, process control, and repeatability. By varying different inputparameters, we have optimized simulated patterns with controlled periodicity,density and aspect ratio also it can be programmed to obtain images ofinterference results showing interference intensity distributions.

Design and Simulation of Symmetric Nanostructures Using Two-Beam Modulated Interference Lithography Technique