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A simple process for chemical vapor deposition of ultra SD single wall carbonnanotubes has been developed. In this process, an iron nitrate nonahydratesolution in isopropyl alcohol with a concentration of 400 ug/mlit was used tocatalyze nanoparticles formation on an oxidized silicon wafer. The oxide on thesubstrate was made of a thick layer of wet oxide sandwiched between tow thinlayers of dry oxide. The process results in semiconducting single-walled carbonnanotubes (SWNTs) with diameter of less than 0.7nm and more than 1ev band gapenergy, which are amongst the smallest diameters of SWNTs ever reported.

CVD Synthesis of Small-Diameter Single Walled Carbon Nanotubes on Silicon