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One of the main goals of DNA nanotechnology is to provide a viable solutionto the limitations of top-down approaches in microfabrication schemes. Althougha completely practical bottom-up approach is yet to be realized, there has beengreat progress in integrating the two approaches in the past few years. In thisvein, we present a novel surface assisted fabrication scheme able to directlycontrol the coverage rate, from 0 to 100%, of functionalized DNA nanostructureson centimeter-scaled silica (SiO_2) substrates which is one key to harnessingDNA's unique properties in electronics and photonics. Furthermore,electrostatic interactions between the DNA structures and the surface lead todramatic topological changes of the structures, creating novel formations ofthe crystals. These results provide a direct route to applying fullyfunctionalized layers of DNA nanostructures to current technologies inSiO_2-based electronics and photonics.

Coverage Control of Silica-Assisted Grown DNA Crystals