English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Tools annual

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Presents the access of premium content as premium feature

Premium Content

Global: Zendy Plus annual

Global: Zendy Free Plan

Copper ferrite thin films were rf sputtered at a power of 50W. The asdeposited films were annealed in air at 800{\deg}C and slow cooled. Thetransmission electron microscope (TEM) studies were carried out on as depositedas well as on slow cooled film. Significantly larger defect concentration,including stacking faults, was observed in 50W as deposited films than thefilms deposited at a higher rf power of 200W. The film annealed at 800{\deg}Cand then slow cooled showed an unusual grain growth upto 180nm for a filmthickness of ~240nm. These grains showed Kikuchi pattern.

Transmission Electron Microscopy Studies on RF Sputtered Copper Ferrite Thin Films