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NbN films were deposited on SS substrates by reactive DC magnetron sputteringat various N2 flow rates and substrate biasing. Effect of N2 flow rate andsubstrate biasing has been studied on deposition rate, surface hardness,crystal-structure and adhesion values. Process parameters were optimized fordeposition of NbN coatings. NbN coatings were then deposited on to MSsubstrates as such and with Nb interlayer deposited by magnetron sputtering.The thickness of interlayer was 2 \mum. The duplex coating has been studied forthe improvement with respect to surface hardness by Knoop micro indentation andcorrosion performance by potentiodynamic polarization technique. Open circuitpotentials were also measured.

Magnetron Sputtered NbN Films with Nb Interlayer