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The copper ferrite thin films have been deposited by RF sputtering at a 50Wrf power. The As-deposited films are annealed in air at $800^{\circ}$C and thenslow cooled. The As-deposited (AD) as well as slow cooled (SC) films arestudied using a SQUID Magnetometer. The M Vs H curves have been recorded atvarious temperatures between 5K to 300K. The coercivities obtained from the MHcurves are then plotted against temperature (T). The magnetization in the filmsdoes not saturate, even at the highest field of 7T. The high field part of theM Vs H curves is fitted using the H1/2 term of Chikazumi expression M(H)= Q*(1-a /Hn), with n=1/2. The variation of coefficient 'a' of H1/2 term has beenobserved with temperature (T). An attempt has been made to correlate this withthe coercivity (Hc) in the case of annealed films.

Temperature dependence of Magnetic properties in Nanocrystalline copper ferrite thin films