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A study on chemical vapor deposition(CVD) of and the electrochromic properties of the CVD films have been carried out. The crystalinity, purity, and growth rate of the films depending on substrate temperatures are investigated. The highest growth rate is at the substrate temperatures above and the estimated activation energy for overall film growth is about 45.9 kJ/mol at the temperatures of , where the CVD process is controlled by a surface reaction kinetics. The films grown below are amorphous, while those deposited above are crystalline. The effects of thickness and deposition temperature of the films on electrochromic activity are also investigated. The coloration efficiency of the films increases with increase in film thickness and decrease in deposition temperature.

Preparation of WO3Films by CVD and their Application in Electrochromic Devices

Preparation of WO₃Films by CVD and their Application in Electrochromic Devices