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Density-functional-theory-based calculations of formation energy and concentration of the silicon monovacancy
Author(s) -
Sholihun Sholihun,
Mineo Saito,
Takahisa Ohno,
Takahiro Yamasaki
Publication year - 2015
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.54.041301
Subject(s) - vacancy defect , silicon , crystallographic defect , materials science , melting point , density functional theory , atomic units , atomic physics , chemistry , thermodynamics , molecular physics , computational chemistry , physics , crystallography , optoelectronics , quantum mechanics , composite material
By using first-principles calculations, we study the formation energy and concentration of the silicon monovacancy. We use large-scale supercells containing up to 1728 atomic sites and confirm the convergence of calculational results with respect to the cell size. The formation energy is calculated to be 3.46 eV, and the vacancy concentration at the silicon melting point is estimated to be 7.4 × 1016cm-3. These values are consistent with experimental results. We find that the vibrational effect significantly increases the vacancy concentration about 104 times. © 2015 The Japan Society of Applied Physics.Embargo Period 12 month

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