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We introduce a novel nanofabrication technique to directly deposit catalystpads for the chemical vapor deposition synthesis of single-walled carbonnanotubes (SWCNTs) at any desired position on a substrate by Gallium focusedion beam (FIB) induced deposition of silicon oxide thin films from themetalorganic Tetraethyl orthosilicate (TEOS) precursor. A high resolution inthe positioning of the SWCNTs is naturally achieved as the imaging anddeposition by FIB are conducted concurrently in situ at the same selected pointon the substrate. This technique has substantial advantages over the currentstate-of-the-art methods that are based on complex and multistep lithographyprocesses.

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Lithography-free control of the position of single walled carbon  nanotubes on a substrate by focused ion beam induced deposition of catalyst  and chemical vapor deposition