Influence of Ba-to-Si deposition rate ratios on the electrical and optical properties of B-doped BaSi2 epitaxial films
Author(s) -
Shu Sugiyama,
Yudai Yamashita,
Kaoru Toko,
Takashi Suemasu
Publication year - 2019
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/1347-4065/ab65ae
Subject(s) - epitaxy , doping , molecular beam epitaxy , substrate (aquarium) , materials science , deposition (geology) , electrical resistivity and conductivity , layer (electronics) , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , paleontology , sediment , geology , oceanography , engineering , chromatography , electrical engineering , biology
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