Open AccessFabrication of As-doped n-type BaSi2 epitaxial films grown by molecular beam epitaxy
Author(s) -
Sho Aonuki,
Yudai Yamashita,
Kaoru Toko,
Takashi Suemasu
Publication year - 2019
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/1347-4065/ab5b7a
Subject(s) - molecular beam epitaxy , doping , epitaxy , hall effect , substrate (aquarium) , analytical chemistry (journal) , materials science , crucible (geodemography) , optoelectronics , electrical resistivity and conductivity , chemistry , nanotechnology , physics , layer (electronics) , oceanography , computational chemistry , quantum mechanics , chromatography , geology
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