English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Graphitic carbon nitride (g-C3N4) is one of the metal-free photocatalyst materials. Investigation was carried out on the synthesis of g-C3N4 films by thermal CVD using melamine. A thermal chemical vapor deposition apparatus of the hot-wall type was used for g-C3N4 film deposition on a Si substrate. Melamine was used as the feedstock. The heating temperatures of the substrate were varied from 773 to 973 K. The g-C3N4 films were analyzed by SEM, XRD, Raman spectroscopy, FT-IR, and XPS. The thickness of the deposited films at a heating temperature of 873 K was from 0.6 to 1.0 μm. A peak of g-C3N4 was observed in the XRD patterns at heating temperatures of 873 and 973 K. From FT-IR and XPS, C and N bonds were observed at a heating temperature of 873 K. We concluded that g-C3N4 films of thickness 0.6 to 1.0 μm were obtained at a heating temperature of 873 K.

Synthesis of graphitic carbon nitride films from melamine by thermal CVD