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Chemical reactions in solid phase are now widely used in modern technology. All electronic devices are products made on their basis. For example, such manufacturing method as vacuum epitaxy uses a sequence of chemical reactions accompanying removal of intrinsic oxides from the substrate surface and formation of heterointerface during deposition. The temperature (energy) of reagents coming from a source is as a rule much higher than the temperature of the substrate, and the atomically clean surface is highly active, all in all this creates the required reaction medium. At the next stage of layer engineering it is possible to apply electron-beam lithography, which actually is a directional spatially localized reaction in solid phase, activated by radiation, etc.

Observation of Chemical Reactions in Solid Phase Using X-Ray Photoelectron Spectroscopy