Characteristics of SiO2 Etching by Capacitively Coupled Plasma with Different Fluorocarbon Liquids (C7F14, C7F8) and Fluorocarbon Gas (C4F8) | Zendy

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Characteristics of SiO₂ Etching by Capacitively Coupled Plasma with Different Fluorocarbon Liquids (C₇F₁₄, C₇F₈) and Fluorocarbon Gas (C₄F₈)

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