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Two-level modeling for nanoscale pattern formation on silicon target byAr$^+$ ion sputtering is presented. Phase diagram illustrating possiblenanosize surface patterns is discussed. Scaling characteristics for thestructure wavelength dependence versus incoming ion energy are defined. Growthand roughness exponents in different domains of the phase diagram are obtained.

Morphology change of the silicon surface induced by Ar$^+$ ion beam sputtering