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Effect of pump combinations on the vacuum characteristics of vacuum system was simulate d for optimum design of system. In this investigation, the feas ibility of modelling mechanism for VacS im Multi simulator was proposed. Simulation results of various pumping combinations showed the possibi lities and reliabilities of simulation for the performance of vacuum system in specific semiconductor p rocessing. Simulation of roughing pump presented the expected pumping behaviors based on commerc ial specifications of employed pumps. Application of booster pump exhibited the high pumping efficien cy for middle vacuum range. Combinations of optimum backing pum p for diffusion and turbo vacuum s ystem were obtained. And, the predictable characteristics of process application of both simulated sy stems were also acquired.

Simulation of Vacuum Characteristics in Semiconductor Processing Vacuum System by the Combination of Vacuum Pumps