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The adhesion of Saccharomyces cerevisiae to hydrophilic alumina (Al2O3) particles and its removal by caustic alkali cleaning were studied. The surface charge properties of S. cerevisiae cells and Al2O3 particles were determined by potentiometric titration as a function of pH. The cells could adhere spontaneously to Al2O3 surfaces even though they had the same type of net charge as that of Al2O3. The maximum adhesion of 44.0mg dry cell/m2 was observed for the adhesion of negatively charged cells to positively charged Al2O3 in the pH range of 4.2 to 6.6. Approximately 43% of S. cerevisiae cells adhering to Al2O3 were desorbed rapidly by rinsing alone and the remainder was removed by subsequent caustic alkali cleaning. The rate of desorption of S. cerevisiae cells during caustic alkali cleaning depended both on the pH and on temperature, and was analyzed by evaluating the first-order desorption rate constant as a measure of cleaning efficiency. After caustic alkali cleaning, whole S. cerevisiae cells were completely removed, but polymeric substances presumably originating from alkali cell lysis remained on the Al2O3 surface.

Adhesion of Saccharomyces cerevisiae to Alumina Surfaces and Its Removal by Caustic Alkali Cleaning.