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TiO2 thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.

journal of surface engineered materials and advanced technology

Comparison on Morphological and Optical Properties of TiO&amp;lt;SUB&amp;gt;2&amp;lt;/SUB&amp;gt; Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation